Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser

Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser Capeluto, Maria G. ; Vaschenko, Georgiy O. ; Grisham, Michael Eric ; Marconi, Mario Carlos ; Ludueña, S. ; Pietrasanta, L. ; Lu, Yunfeng, 1968- ; Parkinson, Bruce Alan ; Menoni, Carmen S. ; Rocca, Jorge, J. "This work was supported by the National Science Foundation (NSF) Engineering Research Center (ERC) for Extreme Ultraviolet Science and Technology under NSF Award EEC-0310717, by the Consejo Nacional de Investigaciones Cientificas y Tecnicas (CONICET), and by the W. M. Keck Foundation." We report the imprinting of nanometer-scale gratings by interferometric lithography at λ = 46.9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl methacrylate using a Lloyd’s mirror interferometer. This first demonstration of nanopatterning using an extreme ultraviolet (EUV) laser illustrates the potential of compact EUV lasers in nanotechnology applications. Colorado State University. Libraries 2006 text ; image application/pdf ECEmcm00024.pdf FACFECEN100436ARTI eng c2006 IEEE

Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser

Capeluto, Maria G. ; Vaschenko, Georgiy O. ; Grisham, Michael Eric ; Marconi, Mario Carlos ; Ludueña, S. ; Pietrasanta, L. ; Lu, Yunfeng, 1968- ; Parkinson, Bruce Alan ; Menoni, Carmen S. ; Rocca, Jorge, J.

"This work was supported by the National Science Foundation (NSF) Engineering Research Center (ERC) for Extreme Ultraviolet Science and Technology under NSF Award EEC-0310717, by the Consejo Nacional de Investigaciones Cientificas y Tecnicas (CONICET), and by the W. M. Keck Foundation."

We report the imprinting of nanometer-scale gratings by interferometric lithography at λ = 46.9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl methacrylate using a Lloyd’s mirror interferometer. This first demonstration of nanopatterning using an extreme ultraviolet (EUV) laser illustrates the potential of compact EUV lasers in nanotechnology applications.

Colorado State University. Libraries

2006

text ; image

application/pdf

ECEmcm00024.pdf

FACFECEN100436ARTI

eng

c2006 IEEE